An nm-level positioning precision and high-speed are required by using macro movement of long stroke linear motor and high-precision micro movement of planar motor in the wafer stage of lithography. In order to reduce the movement scope and acceleration of planar motor, the tracking precision of linear motor must be improved, so this paper presents a combined control strategy based on the combination of zero phase error tracking controller with feed forward (ZPETC-FF) and the disturbance observer (DOB). ZPETC-FF is feed forward controller, which improves the system bandwidth and tracking performance effectively, and reduces the system′s dynamic tracking error, while DOB reduces the influences of the uncertainties, such as external load disturbances, unmodeled dynamics and system parameter perturbation. The experiments show that compared with traditional control method, the proposed control method not only achieves more rapid and accurate tracking of the system, but also has stronger anti-interference ability.