| 引用本文: | 王兵,熊鹰,黎明,李凯.不同反应气源对制备纳米金刚石膜的影响[J].材料科学与工艺,2010,18(1):96-100.DOI:10.11951/j.issn.1005-0299.20100121. |
| WANG Bing,XIONG Ying,LI Ming,LI Kai.Influence of gas reaction source on the preparation of nano diamond films[J].Materials Science and Technology,2010,18(1):96-100.DOI:10.11951/j.issn.1005-0299.20100121. |
|
| 摘要: |
| 为确定两种典型的反应气源对制备纳米金刚石膜的影响,分别以CH4/Ar/H2及CH4/N2混合气体作为反应源,用微波等离子体化学气相沉积(MWPCVD)法制备纳米金刚石薄膜.XRD和Raman分析表明两种气源条件下得到的膜材均为金刚石多晶膜,但用CH4/N2气为反应源沉积的膜材中非金刚石相成分明显更多;AFM和SEM对照分析证实所有膜层的平均晶粒尺寸及表面粗糙度均在几十纳米量级,但CH4/N2气源沉积的膜中容易形成异常长大的晶粒,不利于表面质量的提高.研究结果表明,以CH4/Ar/H2混合气体作为反应气源可制备物相组成纯度更高、表面形态更为优越的纳米金刚石膜. |
| 关键词: 化学气相沉积 金刚石 纳米膜 气源 |
| DOI：10.11951/j.issn.1005-0299.20100121 |
| 分类号:O484.1 |
| 基金项目:国家自然科学基金资助项目(10876032);国防基础科研项目(B3120090020);四川省教育厅青年基金(2006B048) |
|
| Influence of gas reaction source on the preparation of nano diamond films |
|
WANG Bing1, XIONG Ying1, LI Ming2, LI Kai2
|
|
1.School of Materials,Southwest University of Science and Technology,Mianyang 621010,China;2.Institute of Application Electronics,China Academy of Engineering Physics,Mianyang 621900,China
|
| Abstract: |
| To clarify the influence of gas reaction source on the composition and structure of nano diamond films,two typical sorts of mixing gases,namely CH4 + Ar + H2 and CH4 + N2,were respectively used to prepare diamond films with microwave plasma chemical vapor deposition technology. Characterization by XRD and Raman spectroscopy shows that the as-prepared materials are all polycrystalline diamond films,while those grown with CH4 + N2 contain more non-diamond components. It is proved by AFM and SEM contrastive analyses that all obtained films have mean grain sizes and surface roughness within several tens of nanometers,but abnormally grown-up grains have emerged out in the films deposited with CH4 + N2,which is bad for the quality improvement of film surface. The study demonstrates that using CH4 + Ar + H2 as reactive gas source can prepare nano diamond films with higher phase purity and better surface morphology. |
| Key words: chemical vapor deposition diamond nano film gas source |
