| 引用本文: | 王鸿翔,左敦稳,卢文壮,徐峰.工艺条件对金刚石膜红外透射率影响的研究[J].材料科学与工艺,2010,18(3):322-325.DOI:10.11951/j.issn.1005-0299.20100306. |
| WANG Hong-xiang,ZUO Dun-wen,LU Wen-zhuang,XU Feng.Influence of process conditions on IR transmission of diamond film[J].Materials Science and Technology,2010,18(3):322-325.DOI:10.11951/j.issn.1005-0299.20100306. |
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| 摘要: |
| 为了优化金刚石沉积工艺,制备高透射率的CVD金刚石薄膜,采用傅里叶红外光谱仪对不同工艺条件下制备的CVD金刚石膜的红外透射率进行了测量,分析了不同工艺条件对金刚石膜红外透射率的影响,获得了最佳沉积参数.结果表明,金刚石膜的红外透射率与工艺条件密切相关,当衬底温度为750℃,碳源体积分数为2%,压强为2.5kPa时沉积的金刚石膜红外透射率最佳. |
| 关键词: CVD 金刚石膜 红外透射率 工艺条件 |
| DOI：10.11951/j.issn.1005-0299.20100306 |
| 分类号:TQ164 |
| 基金项目:国家自然科学基金资助项目(50605032);江苏省自然科学基金资助项目(BK2007193) |
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| Influence of process conditions on IR transmission of diamond film |
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WANG Hong-xiang,ZUO Dun-wen,LU Wen-zhuang,XU Feng
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1.College of Mechanical and Electrical Engineering,Nanjing University of Aeronautics & Astronautics,Nanjing 20016,China;2.Huaian College of Information Technology,Huaian 223003,China
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| Abstract: |
| To optimize the deposition process of diamond and prepare the diamond with high transmittance,IR transmittance of CVD diamond film prepared under different process conditions was measured using Fourier transform infrared spectroscopy,and the influence of process conditions on IR transmittance of diamond film was analyzed.The best deposition parameters were obtained.The result shows that IR transmittance of the diamond film is closely related to process conditions.When the substrate temperature is 750 ℃,the volume fraction of carbon source is 2%,the pressure is 2.5 kPa,IR transmittance of the deposited diamond film is the best. |
| Key words: CVD diamond film IR transmittance process conditions |
